what is a sputtering target

Sputtering is a proven technology capable of depositing thin films from a wide variety of materials on to diverse substrate shapes and sizes. The process is ...

Our Sputtering targets are created using the technical skills AGC Ceramics has gained through the development of diverse fine ceramic materials. They are of ...

A sputtering target is a material that is used to create thin films in a technique known as sputter deposition, or thin film deposition. During this process the ...

Sputter Targets. There are hundreds of applications requiring that a thin film of material be placed on another material. This process of thin film deposition often ...

Although SPUTTERING as described above seems relatively intuitive, .... For example a 100 mm wafer would require a 150 mm sputter target to achieve +/- 5 % ...

PVD: Sputtering. ? In sputtering, atoms are physically removed from a target. ? Energy is transferred from incoming ions to the target atoms to break the bonds ...

Increasing Sputter Rates. When sputtering dielectric targets using RF power, it is quite possible for the maximum deposition rate on the substrate to be less than ...

Jul 1, 2010 ... Angstrom Sciences Inc. provides a full range of sputtering target materials including: precious metals, pure metals, alloys, ceramics, cermets, ...

American Elements produces materials in sputtering target, foil, rod, wire, sheet, Ingot, and thin film forms.

TheAccuSputter AW4450-Series Production Sputtering Systems are manufactured in the configuration of a manually-loaded system capable of fully...