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AccuSputter AW 4450 - Brand New
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triode sputtering

www.allwin21.com/Item.asp?catid=34&id=373
TheAccuSputter AW4450-Series Production Sputtering Systems are manufactured in the configuration of a manually-loaded system capable of fully...
www.allwin21.com/upload/File/AccuSputter AW 4450 Sputter Deposition Description.pdf
AccuSputter AW4450-Series. Sputtering Deposition Systems. Address: 3521 Leonard Court, Santa Clara, CA95054 U.S.A. Website: http://www.allwin21.com...
 
www.onera.fr/dmsm-en/deposit/index.php
Feb 25, 2008 ... Since the eighties, ONERA has a great competence concerning the deposition of thin or thick layer with a high rate (up to 100 ¦Ìm/h).
iopscience.iop.org/0295-5075/5/5/013
High-Tc superconducting thin films were prepared by DC sputtering. Contrary to diode sputter methods, in thetriode configuration applied here no compositional ...
static.ifp.tuwien.ac.at/homepages/Personen/duenne_schichten/pdf/te_ds_unit5.pdf
(Semiconductors/Insulators). Aims: Methods: RF-sputtering: c/d. Triode sputtering : a-c. Magnetron sputtering a-c. RF-Magnetron: a-d. Ion beam sputtering: c; free ...
engineering.dartmouth.edu/microeng/courses/es194/student/jiaying/sem/II.2.p3.html
Triode Sputtering. Increase the number of electrons emmited by cathode by introducing a thermionic electron emmiter (i.e. hot cathode). Deposition pressure ...
jes.ecsdl.org/content/123/1/65.abstract
Abstract. Using a Si©\gate CMOS tester the MOS compatibility has been demonstrated of a metallization process involving triode sputter etch cleaning of Si prior ...
onlinelibrary.wiley.com/doi/10.1002/sia.740150219/pdf
A triode sputtering source operated at 1.8 mTorr Ar pressure provided high deposition rates (60 di min-') over the outer surface of a cylindrical cathode that was ...
link.aip.org/link/?JVSTAL/6/111/1
Zinc oxide films for thin film piezoelectric transducer applications have been deposited by triode sputtering onto gold film surfaces. Films sputtered under ...
jap.aip.org/resource/1/japiau/v46/i4/p1728_s1
Sputtered films of 12 elementary metals were analyzed for argon content by an rf spark?source mass?spectrographic method. All films were deposited using dc ...
www.sciencedirect.com/science/article/pii/S0026269202000307
A novel sputtering method based on a triode-sputtering set-up is presented. This low-vacuum plasma method enables sputtering of thin films at a pressure range ...
www.vakuum.cz/2a.html
Triode sputter-ion pumps are suited for generating a heavy-hydrocarbon-free ultra-high-vacuum. They are superior to diode and noble sputter-ion pumps in ...
 
www.allwin21.com/upload/File/AccuSputter AW 4450 Sputter Deposition Description.pdf
AccuSputter AW4450-Series. Sputtering Deposition Systems. Address: 3521 Leonard Court, Santa Clara, CA95054 U.S.A. Website: http://www.allwin21.com...
www.allwin21.com/Item.asp?catid=34&id=373
TheAccuSputter AW4450-Series Production Sputtering Systems are manufactured in the configuration of a manually-loaded system capable of fully...

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