www.uccs.edu/~tchriste/courses/PHYS549/549lectures/sputtertech.html
RF Sputter Deposition. schematic of RF sputtering. Good for insulating materials. in DC systems, positive charge builds up on the cathode (target). need 1012 ...
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en.wikipedia.org/wiki/Sputter_deposition
Charge build-up on insulating targets can be avoided with the use of RF sputtering where the sign of the anode-cathode bias is varied at a high rate ( commonly ...
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www.stanford.edu/class/ee311/NOTES/Deposition_Planarization.pdf
The susceptor is heated by using high-intensity lamps, radio frequency ..... In a rf sputtering system, positive ions are generated by collisions of neutral species ...
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www.phasis.ch/index.php?option=com_content&view=article&id=57&Itemid=65
In its simplest representation, the phenomenon of sputtering consists of material erosion from a target on an atomic scale, and the formation of a thin layer of the ...
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www.wisegeek.com/what-is-rf-sputtering.htm
Jul 9, 2012 ... RF sputtering is a technique that's used to create thin films, like those found in computers and semiconductors. Since it uses...
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surface.iphy.ac.cn/sf03/sputtering.htm
The plasma is initiated between the cathode and the anode at pressures in the mTorr range by the application of a high voltage that can be either DC or RF.
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iopscience.iop.org/0953-8984/20/5/055206
Employing r.f. (radiofrequency) magnetron sputtering, molybdenum thin films were fabricated on soda-lime glass substrates for use in Cu(In,Ga)Se2 based solar ...
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iopscience.iop.org/0953-8984/20/5/055206/pdf/0953-8984_20_5_055206.pdf
The effect of deposition parameters on radiofrequency sputtered molybdenum thin films. This article has been downloaded from IOPscience. Please scroll down ...
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www.nano.iisc.ernet.in/RF sputtering manual_2010.pdf
Mar 1, 2010 ... Magnetron sputtering can be done either in DC or RF modes. DC sputtering ... RF sputtering can be done both conducting and non conducting ...
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www.sciencedirect.com/science/article/pii/0042207X67931429
The basic principles of RF sputtering of insulators and their properties are reviewed and an RF sputtering system is described. The effect of various process pa. |