?30" x 28" x 8" stainless steel load lock chamber with aluminum cover
?2" air-operated roughing isolation valve
?3/8" solenoid-operated vent valve
?23" diameter molybdenum annular substrate pallet
?Pallet carrier and chain drive transport
Vacuum System
Roughing
?36.7 cfm mechanical pump for process chamber and load lock roughing
?2" diameter roughing lines with electropneumatic valve
?Surface-area Versa-trapTMin roughing line
High vacuum pumping
?2 stage cryopump with 1000 l/s pumping speed for air, including chevron, water-cooled compressor and lines, automatic regeneration controller and plumbing kit.
?Full flood Meissner trap with 30,000 l/s pumping speed for water vapor
?Insylated LN2 lines
?LN2 sensor, solenoid and relief valve
Control
?Vacuum gauging package including basic digital vacuum gauge control (DGC II), ionization tube and two thermister tubes
?Automatic pump-down controller
?Automatic lock controller
Options
?Diffusion-pump system including 1500 l/s oil diffusion pump, LN2 chevron baffle, water-cooled baffle and water-flow switch.
?Turbomolecular-pumped system including 450 l/s turbo pump, foreline manifold with 11/2" air-operated isolation valve, and water-flow switch(less throttling valve)
?Polycold-compatible quick-purge Meissner trap.
Sputtering Control Module
?3 kw water-cooled RF matching network
?RF power on/off switch
?RF power level control
?4 position rotary sputter mode selector
?3 position rotary target selector
?2 position shutter position switch
?Manual load and tune controls
?15-turn vernier 0-10% bias control
?Forward and reflected RF power meters
?Substrate bias meter
?Target bias meter
?Target-to-table spacing meter
?Servo-MatchTM automatic turning (mounted in lower console)
Cathode Options
?DeltaDC magnetron cathode assembly with water-cooled backing plate and anode
?Delta-to-8-inch round cathode adaptor
?8" diameter RF magnetron cathode assembly
?8" diameter RF diode assembly
?8" diameter DC magnetron cathode assembly
?Delta blank-off plate
?MagnabondTM 8-inch round target kit for DC cathodes
?Bolt-on Delta target kit
Power Options
?2 kw RF Generator
?3 kw RF Generator
?5 kw programmable DC magnetron power supply including digital clock timer
?10 kw programmable DC magnetron power supply including digital clock timer
Utilities
?Rear-mounted electrical, water, gas and LN2 inlet panel
?Power distribution box
?Water-flow switch panel and manifold
System Options
?Precision 3 rpm to 5 rpm servo-driven table drive
?Water-cooled process chamber
?Water-cooled top plate
?Dura gas inlet system
?Wide range digital vacuum gauge control
?Continuous viewing vacuum port
Accessories
?Load lock pumping and heating system including 100 l/s turbomolecular pump, 17.7 cfm mechanical pump, 200oC heater and controller
?Microprocessor for machine and process control
?Programmable RF power stabilizer
?DC sputter with RF bias
?Process chamber 350oC heater (mounted in cathode position)
?Digital clock timers
?Annular pallet nested for 64 2-inch,30 3-inch or 13 4-inch wafers
?Polycold refrigeration system for Meissner trap
?Delta target copper backing plate
?Pressure or flow controllers
Microprocessor Operation Option
Ultek's microprocessor controller option permits automated control of machine functions and process parameters including load lock operation, pump-down venting and all process sequences. Up to five 16-step process sequences can be stored in the system's memory to facilitate process change.
An interactive CRT facilitates programming. Unconditional looping is available for repetitive processes. Other capabilities include: program listing, hard copy records and interface with other computer systems.
