Argon sputtering

1. Sputter deposition - Wikipedia, the free encyclopedia

   en.wikipedia.org/wiki/Sputter_deposition

   The sputtering gas is often an inert gas such as argon. For efficient momentum transfer, the atomic weight of the sputtering gas should be close to the atomic ...
   

   Uses of sputtering - Comparison with other ... - Types of sputter deposition
2. Sputtering - Wikipedia, the free encyclopedia

   en.wikipedia.org/wiki/Sputtering

   Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by .... Sputtering usually uses an argon plasma.
   

   Physics of sputtering - Electronic sputtering - Potential sputtering
3. Sputter deposition

   www.oxford-vacuum.com/background/thin_film/sputtering.htm

   RF, MF and Pulsed Sputter Deposition When the Argon ion strikes the target an electron is released from the surface and combines with the ion to neutralise it, ...
   
4. Sputter Deposition Techniques

   www.uccs.edu/~tchriste/courses/PHYS549/.../sputtertech.html

   schematic of DC sputtering. Parameters: Argon Pressure. deposition rate vs. argonpressure; optimum ... changes with Ar pressure; increases with sputter yield ...
   
5. Sputtering yields of compounds using argon ions - Abstract - Journal ...

   iopscience.iop.org/0022-3727/43/25/253001

   by MP Seah - 2010 - Cited by 6 - Related articles
   An analysis is made of published sputtering yield data for compounds using argonprimary ions at normal incidence to evaluate the validity of simple predictive ...
   
6. Workfunction tuning of zinc oxide films by argon sputtering and ...

   iopscience.iop.org/0022-3727/45/6/065301

   by FL Kuo - 2012 - Cited by 1 - Related articles
   Zinc oxide (ZnO) films were grown by radio frequency magnetron sputter deposition and the changes to its surface composition and workfunction induced by ...